Metal thin film

0601201-100

[DEFINITION]
A metallic film obtained by vapor deposition or sputtering, etc., and having a thickness of from a monoatomic or monomolecular layer to about 10μm.

[DESCRIPTION]
Aluminum, gold, or tungsten thin film is formed by the vapor deposition or sputtering process. From this film, power or signal lines for actuators or sensors are prepared by pattern processing. For example, the metallic film on the substrate is machined by standard photolithography. Another way of processing is the lift-off method in which a resist on the substrate is first patterned, the metallic thin film is deposited on the resist and the exposed substrate, and the film over the resist is removed together with the resist. There are many examples of metal thin film being used in electrostatic actuator electrodes. In recent research, multilayered metal thin film is used as magnetic actuator coils.

[References]
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